Research ArticleOpen accessPhrase in the titleTHE STRUCTURE AND MECHANICAL PROPERTIES OF ALUMINA FILM PREPARED BY RF DIODE SPUTTERINGH. Panitchakan, P. LimsuwanAlumina (Al2O3) films were prepared on Al2O3-TiC substrates by RF diode sputtering. The target sputtering power was varied from 4 to 8 kW. The effects of target sputtering power on the structure and mechanical properties of alumina films were investigated. The results show that the structure of the alumina films deposited at all the target sputtering powers is amorphous. However, … …Physics International, Vol. 4, Issue 1 · 17 Jul 2013 · 6,897 accessesView PDFCite