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American Journal of Applied Sciences

ISSN 1546-9239 (print)eISSN 1554-3641 (online) Open access
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Research Article · Open access · Published 31 May 2005

Displacement of Boron from the Silicon Crystal Nodes by Interstitial Si Atoms During Implantation and Annealing

M. Jadan, A. R. Chelyadinskii, V. Y. Yavid
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  1. doi:10.1016/j.apsusc.2020.148729Found 15 June 2022