Research ArticleOpen accessPhrase in the titlePreparation and Polishing Properties of Spherical Porous Silica AbrasiveHong Lei, Hu Li, Ping Liu, Ruling ChenProblem statement: Abrasive is one of key influencing factors on the polished surface quality in Chemical Mechanical Polishing (CMP). Solid abrasives in CMP slurries are easy to cause polishing scratches. It is well known that reducing the hardness of abrasives would improve the polished surface quality. Therefore, the change in structure or shape of the abrasives means a change in … …Current Research in Nanotechnology, Vol. 1, Issue 1 · 15 Jun 2011 · 9,285 accessesView PDFCite
Research ArticleOpen accessIn the abstractThe Ultra-Precision Polishing of Large Aperture Reaction Bonded Silicon Carbide MirrorYong Shu, Yifan Dai, Ziwen Zheng, Shengyi LiProblem statement: Silicon Carbide (SiC) optical materials have become the first choice for mirrors in space optical systems and large ground-based optical systems due to their outstanding mechanical, physical and optical properties. Compared with traditional optical glasses, SiC optical materials are provided with the characteristics of high hardness and multiphase, which embarrass the high efficient fabrication of SiC mirrors with … …Current Research in Nanotechnology, Vol. 1, Issue 2 · 21 Jun 2011 · 10,815 accessesView PDFCite