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Research ArticleOpen accessPhrase in the titleHigh Deposition Rate of Dual-cathode DC Unbalanced Magnetron SputteringTheeranon Chaiyakun, Wuttichai Phae-Ngam, Jedsada PrathumsitDual-cathode dc unbalanced magnetron sputtering for the deposition of ternary compound films with a high deposition rate was designed and constructed. It consists of two magnetrons of opposite magnetic polarities. Each magnetron consists of central and outer ring magnets with the residual inductions of 500 and 600 mT, respectively. The testing results of the system showed that high plasma volume … …American Journal of Applied Sciences, Vol. 17, Issue 1 · 14 Oct 2020 · 7,205 accessesView PDF Cite

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