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American Journal of Engineering and Applied Sciences

ISSN 1941-7020 (print)eISSN 1941-7039 (online) Open access
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Research Article · Open access · Published 9 January 2021

XPS Studies of the SiO2 Substrates and Thermoelectric Thin Films of Sn/Sn+SnO2 under the Effects of the Different Thermal Treatments

Richard Lagle, Stephen Egarievwe, Satilmis Budak, Mebougna Drabo
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Citing articles (2)

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  1. doi:10.1016/j.matchar.2024.114504Found 6 November 2024
  2. doi:10.1007/s12633-024-02938-5Found 14 April 2024