Sign inSubmit

American Journal of Applied Sciences

ISSN 1546-9239 (print)eISSN 1554-3641 (online) Open access
Sign up for alertsSubmit manuscript
Research Article · Open access · Published 14 October 2020

High Deposition Rate of Dual-cathode DC Unbalanced Magnetron Sputtering

Theeranon Chaiyakun, Wuttichai Phae-Ngam, Jedsada Prathumsit
ArticleArticle metrics

Since publication

7,205Views
4,884PDF downloads
4Citations (Crossref)

Views and downloads by month

NovDecJanFebMarAprMayJunJulAugSepOct
Views PDF downloadsLast 12 months, counted as COUNTER asks (robots and repeat clicks within 30 seconds left out)
Show as a table
Views and downloads by month
MonthViewsDownloads
Nov 2025182122
Dec 2025138117
Jan 2026137105
Feb 202611286
Mar 2026228130
Apr 2026135134
May 2026165112
Jun 2026199116
Jul 2026186109
Aug 20269589
Sep 202612398
Oct 2026117114

Citing articles (4)

Read from Crossref’s cited-by service every week, newest first.

  1. doi:10.1016/j.vacuum.2026.115870Found 8 October 2026
  2. doi:10.1016/j.jallcom.2025.180430Found 16 April 2025
  3. doi:10.1016/j.materresbull.2025.113301Found 10 January 2025
  4. doi:10.1016/j.optmat.2024.115166Found 18 March 2024