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Author

Ding Guifu

Shanghai Jiao Tong University, China
1 article in our journals

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Research ArticleOpen accessResearch in the Improvement of Wettability of Micro-Structure in Patterned ElectrodepositionLi Guangyang, Wang Hong, Yuan Yang et al.Problem statement: The high aspect-ratio electrodeposition was widely used in the manufacture of non-silicon MEMS devices. The wetting of high aspect-ratio micro-structure in electrolyte was important to the uniformity of micro-structure. Approach: In this study, to enhance the wettability of micro-structures in electrolyte, the effect of Sodium Dodecyl Sulfate (SDS) and O2 plasma surface modification were discussed. Contact Angles (CA) … …Current Research in Nanotechnology, Vol. 1, Issue 1 · 15 Jun 2011 · 7,275 accessesView PDFCite