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Research ArticleOpen accessIn the abstractCharacterization of Boron Carbonitride (BCN) Thin Films Deposited by Radiofrequency and Microwave Plasma Enhanced Chemical Vapor DepositionM.A. Mannan, M. Nagano, K. Shigezumi et al.Boron carbonitride (BCN) thin films with a thickness of ~4 µm were synthesized on Si (100) substrate by radiofrequency and microwave plasma enhanced chemical vapor deposition using trimethylamine borane [(CH3)3N.BH3)] as a molecular precursor. The microstructures of the films were evaluated using field emission scanning electron microscopy (FE-SEM) and X-ray diffractometry (XRD). Fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron … …American Journal of Applied Sciences, Vol. 5, Issue 6 · 30 Jun 2008 · 7,371 accessesView PDFCite